Categories | Optical Window |
---|---|
Brand Name: | LONGWAY |
Model Number: | YY22353312 |
Certification: | ISO9001 |
Place of Origin: | China |
MOQ: | 500 pieces |
Price: | NEGOTIATION |
Payment Terms: | D/P,T/T,Western Union |
Supply Ability: | 90000 Pieces per Month |
Packaging Details: | electrolytic capacitor paper,foam,carton |
Surface: | Optical grade |
Transmission: | >90 % |
Coating: | Available |
Processing: | Polishing |
Application: | Optics and Laser |
OEM: | Available |
Optical Flatness Critical Glass Disc Substrates for Thin-Film Deposition
Material
High-Purity Glass: Typically made from fused silica (JGS1/JGS2), borosilicate, or quartz, selected for ultra-low thermal expansion and chemical inertness.
Fused Silica: Preferred for its exceptional homogeneity, low OH content, and resistance to thermal shock.
Borosilicate: Cost-effective alternative with moderate thermal stability and good surface polishability.
Surface Quality: Engineered with λ/10 to λ/20 flatness to ensure minimal deviation for precision coatings.
Key Properties
Optical Flatness: Surface flatness ≤ λ/10 (at 632.8 nm), critical for uniform thin-film deposition and minimizing wavefront distortion.
Thermal Stability: Low coefficient of thermal expansion (e.g., 0.55 x 10⁻⁶/°C for fused silica) prevents deformation during high-temperature processes like CVD or sputtering.
Chemical Resistance: Inert to acids, plasmas, and solvents, ensuring durability in aggressive deposition environments.
Surface Homogeneity: Refractive index uniformity (±5 x 10⁻⁶) avoids optical distortions in coated films.
Mechanical Durability: High hardness (Mohs 5–7) resists scratching during handling and processing.
Function
Thin-Film Substrate: Provides an ultra-flat, stable base for depositing coatings (anti-reflective, dielectric, metallic).
Process Compatibility: Compatible with PVD, CVD, ALD, and sputtering techniques, ensuring uniform film adhesion and thickness.
Metrology Reference: Serves as a calibration standard for interferometers and surface profilers due to precise flatness.
Applications
Semiconductor Manufacturing: Photomasks, EUV lithography mirrors, and optical MEMS devices.
Optics Industry: Coated filters, beam splitters, and laser optics requiring nanometer-level precision.
Research & Development: Nanotechnology, photonics, and quantum computing experiments.
Aerospace & Defense: Precision sensors, satellite optics, and laser guidance systems.
Medical Devices: Optical coatings for imaging systems, endoscopes, and diagnostic equipment.
Name | Glass disc, Glass wafer, Glass substrate, Sight glass |
ofloat | |
Diameter Tolerance | +0/-0.2 mm |
Thickness Tolerance | +/-0.2 mm |
Processed | By Cutting,Grinding, Polishing |
Working temperature | Resisting high temperature shock |
Surface Quality | 80/50,60/40,40/20 |
Material Quality | No scratches and air bubble |
Transmission | >90% for visible light |
Chamfer | 0.1-0.5 mm x 45 degree |
Surface Coating | Available |
Usage | Photography, Lighting system, industrial area. |
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