• China Feiteng Magnetron Cr Sputtering Target OD127*ID458*10 factory
    ...Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Related product magnetron sputtering target Rotary Target ito rotary target Titanium Rotary Target Vacuum Package Rotary Target titanium sputtering target Vacuum Coating Target... more
    Brand Name:Feiteng
    Model Number:Titanium tube target
    Place of Origin:Baoji, Shaanxi, China

    Feiteng Magnetron Cr Sputtering Target OD127*ID458*10

  • China Zirconium Rotatable Sputtering Target For PVD Coating Systerm High Density factory
    ...Sputtering Target Zirconium Rotatable Sputtering Target , Zirconium Rotatable Target , Zirconium Sputtering Target , Zirconium Rotary Sputtering Target , Zirconium Rotating Sputtering Target. Description JINXING company focus on the sputtering target ( Rotatable sputtering target , Planar Sputtering target , Spray Rotary sputtering target , Noble Metal sputtering target... more
    Brand Name:JINXING
    Model Number:Zirconium Sputtering Target
    Place of Origin:China

    Zirconium Rotatable Sputtering Target For PVD Coating Systerm High Density

  • China 3N5 99.95% Molybdenum Sputtering Target For Vacuum Coating factory
    ... There are two kinds of molybdenum sputtering targets:molybdenum planar target and molybdenum rotary target. Molybdenum sputtering target is one kind of industrial material, which is widely used in conductive glass, STN / TN / TFT-LCD, optical glass, more
    Brand Name:Sanhui
    Model Number:Mo1
    Place of Origin:Henan, China

    3N5 99.95% Molybdenum Sputtering Target For Vacuum Coating

  • China Titanium Ti Ti-Al Zr Cr Sputtering Target Disc For PVD Coatiing factory
    ... high-purity metals or ceramics using advanced technologies such as melting, sintering, synthesis, and precision machining. We provide sputtering target products in a wide range of materials, purities, and shapes. Each target is fabricated according to the more
    Brand Name:Changsheng
    Model Number:ASME B16.9
    Place of Origin:China

    Titanium Ti Ti-Al Zr Cr Sputtering Target Disc For PVD Coatiing

  • China Natural Compound Fused Silica Sputtering Target High Temperature Resistant factory
    High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of the most abundant materials on the planet: ... more
    Brand Name:ZCQ
    Model Number:ZCQ
    Place of Origin:China

    Natural Compound Fused Silica Sputtering Target High Temperature Resistant

    Yantai ZK Optics Co., Ltd.
    [Beijing,China]
  • China 99.6% Purity GR1 GR2 Round Titanium Sputtering Target Hardware factory
    ... beam or ion beam, just like the target is hit, so the material used in the sputtering process is called the "sputtering target". From metal titanium to titanium sputtering target Titanium sputtering target is a titanium product made of titanium metal as more
    Brand Name:LHTI
    Model Number:LH-10
    Place of Origin:China

    99.6% Purity GR1 GR2 Round Titanium Sputtering Target Hardware

  • China Pulsed Laser Deposition PLD Systems Sputter Target for DC RF Magnetron Sputtering Systems factory
    ... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and more
    Brand Name:ZG
    Model Number:MS
    Place of Origin:CHINA

    Pulsed Laser Deposition PLD Systems Sputter Target for DC RF Magnetron Sputtering Systems

  • China Molybdenum Planar Sputtering Targets factory
    ... Sputtering Target Molybdenum Sputtering Target 10.2g/Cm3 Molybdenum Plate 10.2g/Cm3 Send Email Inquiry Now Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets are mainly used for flat panel displays, more
    Categories:Molybdenum Products
    Country/Region:china

    Molybdenum Planar Sputtering Targets

  • China Round Molybdenum Products Molybdenum Sputtering Target For Vacuum Sputtering Coating Molybdenum Target Molybdenum Disc factory
    ... from molybdenum powder. In most cases, it is made from the anode itself, which is sintered molybdenum powder, and the target is formed by the anode. Anodes can be stationary or rotating anodes. Other standard methods, chemical vapor deposition, or again, more
    Brand Name:PRM
    Model Number:custom
    Place of Origin:China

    Round Molybdenum Products Molybdenum Sputtering Target For Vacuum Sputtering Coating Molybdenum Target Molybdenum Disc

  • China DIN2462 Stainless Steel Tubing For Planar Sputtering Target factory
    Torich 133*4*4113mm 304L Planar Sputtering Target Sputtering Target Stainless Steel Tube Torich 133*4*4113mm 304L Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0.1-0.4mm Tolerance of ID:124.5-125.2mm ... more
    Brand Name:TORICH
    Model Number:304L
    Place of Origin:China

    DIN2462 Stainless Steel Tubing For Planar Sputtering Target

    TORICH INTERNATIONAL LIMITED
    [Zhejiang,China]
  • China Non Magnetic Molybdenum Copper Alloy Magnetron Sputtering Target Molybdenum Alloy Target factory
    Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron sputtering targets is mainly by infiltration method. First, molybdenum powder... more
    Brand Name:PRM
    Model Number:custom
    Place of Origin:China

    Non Magnetic Molybdenum Copper Alloy Magnetron Sputtering Target Molybdenum Alloy Target

  • China W-Ti Metal Sputtering Targets Planar Billet For Semiconductor Physical Vapor Depot factory
    ...sputtering target Plate Planar Billet for Semiconductor Physical Vapor Deposition Tungsten-titanium (WTi) films are known to act as the effective diffusion barrier between Al and Si in semiconductor and photovoltaic cells industry. WTifilms are typically deposited as thin films by physical vapor deposition (PVD) through sputtering of a WTialloy target. It is desirable to produce a target... more
    Brand Name:FGD
    Model Number:fgd t-002
    Place of Origin:China

    W-Ti Metal Sputtering Targets Planar Billet For Semiconductor Physical Vapor Depot

  • China TZM Molybdenum Disc SGS Molybdenum Sputtering Target For Medical Chemical Industrial factory
    ...Sputtering Target plate sheets Product Description - uniform grain with densified microstructure ensures longer use time. - High special strenghth, high melt point - excellent corrosive resistance, good thermal resistance. - professional after-sales service Commodity Name Pure molybdenum sputtering target... more
    Brand Name:HMD
    Model Number:NONE
    Place of Origin:CHN

    TZM Molybdenum Disc SGS Molybdenum Sputtering Target For Medical Chemical Industrial

  • China NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy factory
    NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's requirements Technique Hot rolled cold rolled Length as customer's request ... more
    Brand Name:TOBO
    Model Number:NI 200
    Place of Origin:China

    NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy

    TOBO STEEL GROUP CHINA
    [Shanghai,China]
  • China 99.99%  Pure Titanium Disc 4n High Purity Ti Metal Sputtering Target  Low Density factory
    Pure Titanium 99.99% 4n Disc High Purity Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are low density, high mechanical strength and ... more
    Brand Name:GNEE
    Model Number:TiP0001
    Place of Origin:Henan

    99.99% Pure Titanium Disc 4n High Purity Ti Metal Sputtering Target Low Density

  • China indium tin oxide ITO sputting target for film factory
    Chemical Formula In2O3/SnO2 Relative Density >=99.5% Crystal Particle Size 5~15µm Electrical Resistivity 0.1×10-3Ω·cm (High Density) Linear Thermal Expansion 8.2×10-3K-1 Purity >=99.99% Appearance Black (High Density) more
    Minimum Order Quantity:5pcs
    Price:15-20USD/Piece
    Packaging Details:1.Inner polybag, outer in PP woven bag. 2.According to customer's request.

    indium tin oxide ITO sputting target for film

  • China Pure Rare Earth Oxides Hafnium Cylinder Pellet Hf Sputtering Targets Material factory
    Hafnium Pellet 99.9% Pure Hf pellet 3N for sale Products attributes of Hf pellets Item Name PVD Coating materials Hf pellet Purity 99.99% Shape Square/Round, According to your request according to your request Available size Normal size:2*5mm,3*3mm,6*6mm ... more
    Brand Name:High Broad
    Model Number:Hf sputtering targets
    Place of Origin:China

    Pure Rare Earth Oxides Hafnium Cylinder Pellet Hf Sputtering Targets Material

  • China ITO Glass Magnetron Sputtering Coating Machine ,  Ag / SiO Layer For Eletronic Display factory
    ... glass substrate. Like eletronic display, ITO coated microscope slide, Transparent shielding glass, conducting glass, defrosting film, De-icing film coating, ITO Glass PVD Sputtering Coating Plant Technical Configurations: 1) DC Sputtering Sources: Cu, Al, more
    Brand Name:ROYAL
    Model Number:RTSP800
    Place of Origin:Made in China

    ITO Glass Magnetron Sputtering Coating Machine , Ag / SiO Layer For Eletronic Display

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