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Excellent UV Compatibility Benzil Dimethyl Ketal For Photosensitive Resin Printing BDK is soluble in ethyl acetate, hot methanol, isopropanol, insoluble in water, easy to decompose in acid, stable in alkaline, and sensitive to light. CAS No.: 24650-42...
Excellent UV Compatibility Benzil Dimethyl Ketal For Photosensitive Resin Printing BDK is soluble in ethyl acetate, hot methanol, isopropanol, insoluble in water, easy to decompose in acid, stable in alkaline, and sensitive to light. CAS No.: 24650-42... more
Brand Name:DR
Model Number:BDK
Place of Origin:China
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...Dimethylxantheonone-4-acetic acid Synonyms: 5,6-dimethylxanthenoneacetic acid;5,6-Dimethylxantheonone-4-acetic acid;DMXAA;vadimezan;(5,6-DIMETHYL-9-OXO-XANTHEN)-4-ACETIC ACID;5,6-Dimethyl-9-oxo-9H-xanthene-4-acetic acid;5,6-Dimethylxanthenone-4-acetic acid...
...Dimethylxantheonone-4-acetic acid Synonyms: 5,6-dimethylxanthenoneacetic acid;5,6-Dimethylxantheonone-4-acetic acid;DMXAA;vadimezan;(5,6-DIMETHYL-9-OXO-XANTHEN)-4-ACETIC ACID;5,6-Dimethyl-9-oxo-9H-xanthene-4-acetic acid;5,6-Dimethylxanthenone-4-acetic acid... more
Model Number:117570-53-3
Place of Origin:China
Certification:ISO,SGS
DMXAA CAS: 117570-53-3
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..., Cera Microcristallina, Polybutene, Phenyl Trimethicone, Synthetic Fluorphlogopite, Synthetic Wax, Dimethicone, Silica, Silica Dimethyl Silylate, Ci 77492, Ci 77491, Phytosteryl Isostearate, 1,2-Hexanediol, Tocopheryl Acetate, Lecithin, Polyhydroxystearic
..., Cera Microcristallina, Polybutene, Phenyl Trimethicone, Synthetic Fluorphlogopite, Synthetic Wax, Dimethicone, Silica, Silica Dimethyl Silylate, Ci 77492, Ci 77491, Phytosteryl Isostearate, 1,2-Hexanediol, Tocopheryl Acetate, Lecithin, Polyhydroxystearic more
Brand Name:OEM/ODM
Model Number:CZ-008
Place of Origin:Guangzhou, China
Light Beige Make Up Concealer Liquid Foundation High Natural Coverage For Dark Skin