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Chromium Sputter Coater Targets,Chromium Cr Sputtering Targets,Disc or Annular Sputter Targets for Sputter Coaters Information Chromium is one of the most popular metals in the world. Chromium is a silvery, lustrous, hard, and brittle metal known for its ...
Chromium Sputter Coater Targets,Chromium Cr Sputtering Targets,Disc or Annular Sputter Targets for Sputter Coaters Information Chromium is one of the most popular metals in the world. Chromium is a silvery, lustrous, hard, and brittle metal known for its ... more
Brand Name:JINXING
Model Number:Chromium Sputter Coater Targets
Place of Origin:China
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... high-purity metals or ceramics using advanced technologies such as melting, sintering, synthesis, and precision machining. We provide sputtering target products in a wide range of materials, purities, and shapes. Each target is fabricated according to the
... high-purity metals or ceramics using advanced technologies such as melting, sintering, synthesis, and precision machining. We provide sputtering target products in a wide range of materials, purities, and shapes. Each target is fabricated according to the more
Brand Name:Changsheng
Model Number:ASME B16.9
Place of Origin:China
Titanium Ti Ti-Al Zr Cr Sputtering Target Disc For PVD Coatiing
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...Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Related product magnetron sputtering target Rotary Target ito rotary target Titanium Rotary Target Vacuum Package Rotary Target titanium sputtering target Vacuum Coating Target...
...Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Related product magnetron sputtering target Rotary Target ito rotary target Titanium Rotary Target Vacuum Package Rotary Target titanium sputtering target Vacuum Coating Target... more
Brand Name:Feiteng
Model Number:Titanium tube target
Place of Origin:Baoji, Shaanxi, China
Feiteng Magnetron Cr Sputtering Target OD127*ID458*10
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...disc sputtering target for Chemcial industrial Product name: Titanium Sputtering Target Materail: Pure Titanium Gr2 or titanium alloy Gr5 , Ti-Al , Ti-Cr, Ti-Zr etc. Other material: Chrome, Zirconium , Copper , tungsten etc. Shape: Round Dimensions: 60/65/70/80/85/90/95/100(D)×20/30/32/35/40/42/45/50(T) ,can be customized Application: Coating industry, sputtering...
...disc sputtering target for Chemcial industrial Product name: Titanium Sputtering Target Materail: Pure Titanium Gr2 or titanium alloy Gr5 , Ti-Al , Ti-Cr, Ti-Zr etc. Other material: Chrome, Zirconium , Copper , tungsten etc. Shape: Round Dimensions: 60/65/70/80/85/90/95/100(D)×20/30/32/35/40/42/45/50(T) ,can be customized Application: Coating industry, sputtering... more
Brand Name:LHTI
Model Number:LH-10
Place of Origin:China
Diameter 100mm 200mm 300mm Titanium Sputtering Target For Vacuum Coating Industry
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... to corrosion. Molybdenum is widely used in sputtering applications. Shape and Structure: Molybdenum Sputtering Targets are typically disc-shaped or rectangular in form. They have a flat and uniform surface, ensuring consistent sputtering performance. The
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... from molybdenum powder. In most cases, it is made from the anode itself, which is sintered molybdenum powder, and the target is formed by the anode. Anodes can be stationary or rotating anodes. Other standard methods, chemical vapor deposition, or again,
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...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering
...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering more
Brand Name:Sanhui
Model Number:Mo1
Place of Origin:Henan, China
10.2g/Cm3 Pure Molybdenum Rectangular/Round Plate Sputtering Target For Coating
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...Disc sheet plate, Sputtering Target plate sheets Product Description - uniform grain with densified microstructure ensures longer use time. - High special strenghth, high melt point - excellent corrosive resistance, good thermal resistance. - professional after-sales service Commodity Name Pure molybdenum sputtering target...
...Disc sheet plate, Sputtering Target plate sheets Product Description - uniform grain with densified microstructure ensures longer use time. - High special strenghth, high melt point - excellent corrosive resistance, good thermal resistance. - professional after-sales service Commodity Name Pure molybdenum sputtering target... more
Brand Name:HMD
Model Number:NONE
Place of Origin:CHN
TZM Molybdenum Disc SGS Molybdenum Sputtering Target For Medical Chemical Industrial
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High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of the most abundant materials on the planet: ...
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...ough precision processing, featuring excellent film uniformity, density, and sputtering stability. It is suitable for various coating processes, such as magnetron sputtering and ion beam sputtering. Application Areas 1.Semiconductor Memory Chips: Used for
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Pure Titanium 99.99% 4n Disc High Purity Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are low density, high mechanical strength and ...
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... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and
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Torich 133*4*4113mm 304L Planar Sputtering Target Sputtering Target Stainless Steel Tube Torich 133*4*4113mm 304L Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0.1-0.4mm Tolerance of ID:124.5-125.2mm ...
Torich 133*4*4113mm 304L Planar Sputtering Target Sputtering Target Stainless Steel Tube Torich 133*4*4113mm 304L Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0.1-0.4mm Tolerance of ID:124.5-125.2mm ... more
Brand Name:TORICH
Model Number:304L
Place of Origin:China
DIN2462 Stainless Steel Tubing For Planar Sputtering Target
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Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron sputtering targets is mainly by infiltration method. First, molybdenum powder...
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...sputtering target Plate Planar Billet for Semiconductor Physical Vapor Deposition Tungsten-titanium (WTi) films are known to act as the effective diffusion barrier between Al and Si in semiconductor and photovoltaic cells industry. WTifilms are typically deposited as thin films by physical vapor deposition (PVD) through sputtering of a WTialloy target. It is desirable to produce a target...
...sputtering target Plate Planar Billet for Semiconductor Physical Vapor Deposition Tungsten-titanium (WTi) films are known to act as the effective diffusion barrier between Al and Si in semiconductor and photovoltaic cells industry. WTifilms are typically deposited as thin films by physical vapor deposition (PVD) through sputtering of a WTialloy target. It is desirable to produce a target... more
Brand Name:FGD
Model Number:fgd t-002
Place of Origin:China
W-Ti Metal Sputtering Targets Planar Billet For Semiconductor Physical Vapor Depot
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NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's requirements Technique Hot rolled cold rolled Length as customer's request ...
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Pressure-seal Globe Valve 900Lb~2500Lb Standard Material Specifications NO. Part Name CS to ASTM AS to ASTM SS to ASTM Type A105T Type A182 F22 Type A182 F304 Type A182 F316(L) 1 Body A105 A182 F22 A182 F304(L) A182 F316(L) 2 Disc A276 420 A276 304 A276 ...
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Hafnium Pellet 99.9% Pure Hf pellet 3N for sale Products attributes of Hf pellets Item Name PVD Coating materials Hf pellet Purity 99.99% Shape Square/Round, According to your request according to your request Available size Normal size:2*5mm,3*3mm,6*6mm ...
Hafnium Pellet 99.9% Pure Hf pellet 3N for sale Products attributes of Hf pellets Item Name PVD Coating materials Hf pellet Purity 99.99% Shape Square/Round, According to your request according to your request Available size Normal size:2*5mm,3*3mm,6*6mm ... more
Brand Name:High Broad
Model Number:Hf sputtering targets
Place of Origin:China
Pure Rare Earth Oxides Hafnium Cylinder Pellet Hf Sputtering Targets Material